[ODCAD] IBM: Nanotube Transistor, outperformed Si technology
Carbon nanotube can be used for many device application because of
its special electronic properties such as high electron mobility. IBM
developed a transistor based on C6 nanotube with the same drain,
source, gate and dielectric as Si CMOS technology, but using C6
nanotube instead of Si based semiconductor. The transistor has much
better performance than conventional one such as CMOS.
http://www.research.ibm.com/resources/news/20020520_nanotubes.shtml
For IBM, and all of the industry, they still have manufacture
difficulties to massive produce the device.
ODCAD from OD Software Incorporated (ODSI)(http://www.odcad.com/)-the expert and toolkit provider of electronic material, device
Tuesday, April 20, 2004
[ODCAD] Nanofabrication :Imprint Technology of Organic Material
Conventional lithography technology limits its scaling capability by the wave length of light used. The nanotechnology requires line size 100nm or less. The UV light is being pushed to its limit for the task.
One approach is to use short wave length light such as x ray to replace current UV light. This may allow quality small size device production. However, this type of light usually is not time efficient because it can not penetrate very deep of the material resulting a long time production.
However, if it is just making a mold with short wave length light, it is fine because the mold can be reused many times in wafer process for small size device.
A mold can be made from a hard material, and not easily wearable. A desirable pattern can be made with short wave length light. After it is made, it can be used as a stamp.
Organic material such as polymer is usually soft. It can be stamped by a mold. In this way, a desired pattern can be made. This is imprinting technology. It is simple, cheap, and fast. Currently, HP uses this technology in high density organic memory fabrication. The pitch is in the range 40 nm (could be less).
ODCAD from OD Software Incorporated (ODSI)(http://www.odcad.com/)-the expert and toolkit provider of electronic material, device
Conventional lithography technology limits its scaling capability by the wave length of light used. The nanotechnology requires line size 100nm or less. The UV light is being pushed to its limit for the task.
One approach is to use short wave length light such as x ray to replace current UV light. This may allow quality small size device production. However, this type of light usually is not time efficient because it can not penetrate very deep of the material resulting a long time production.
However, if it is just making a mold with short wave length light, it is fine because the mold can be reused many times in wafer process for small size device.
A mold can be made from a hard material, and not easily wearable. A desirable pattern can be made with short wave length light. After it is made, it can be used as a stamp.
Organic material such as polymer is usually soft. It can be stamped by a mold. In this way, a desired pattern can be made. This is imprinting technology. It is simple, cheap, and fast. Currently, HP uses this technology in high density organic memory fabrication. The pitch is in the range 40 nm (could be less).
ODCAD from OD Software Incorporated (ODSI)(http://www.odcad.com/)-the expert and toolkit provider of electronic material, device
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